EUV

EUV (extreme ultraviolet) is a technology (EUV lithography) using short-wavelength light of 13.5nm to draw fine semiconductor circuits of 7nm or less. Essential for high-performance semiconductors such as smartphone and AI chips, its exposure machines are almost monopolized by the Netherlands’ ASML and are cutting-edge devices costing tens of billions of yen per 1 machine.

EUV（極端紫外線）は、波長13.5nmの短い光を用いて、7nm以下の微細な半導体回路を描く技術（EUVリソグラフィ）です。スマートフォンやAIチップなど高性能半導体になくてはならない技術であり、露光装置はオランダのASMLがほぼ独占、1台数百億円する最先端装置です。